Lens resolution 0.7 micron i-line (365nm)

Reduction 5X

Field size 21.2 mm dia ( Xmax= 15mm, Ymax= 19mm )

UDOF 2.1micron ( Slope > 83 degrees )

Uniformity ± 3%

Intensity 200 - 420 mW/c㎡ (PEP option depended)

Reticles 6 (5”), automatic exchange and masking

Wafers 100, 125, 150 mm

Overlay (99.7% of data)
single machine < 150 nm
mach. to ref. mach < 250 nm
mach. to mach < 300 nm

Throughput at 100 mJ/cm
6”, 55 exp. 47 - 70 WPH (PEP option depended )
5”, 35 exp. 60 - 89 WPH(PEP option depended )
4”, 21 exp. 74 – 109 WPH(PEP option depended )