| 矽万（上海）半导体科技有限公司

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产品简介

ASML’s PAS5000/55A, i-line wafer stepper with a 0.48NA Zeiss lens, has been the production tool for many leading 4, 5 and 6” fabs around the world for the past four decades.
The system has a “process in-depended” alignment system, for a superior production overlay. The small footprint of roughly 1m2 makes flexible placing in most existing fabs possible.

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ASML PAS5000/55A i-line晶圆步进光刻机的主要参数：

15x15mm, 0.48NA water cooled Zeiss lens
Handles 4,5- or 6-inch wafers, operator changeable
5-inch reticle handling
Direct reticle referenced, through the lens alignment system, zero-layer alignment
Process in-depended phase grating alignment system
High speed air baring wafer stage
Small footprint