The system uses 405 nm (up to 375 nm) laser source to expose on the photosensitive layer. There is no need to order or make masks. The pattern can be changed according to the user's design.
The system does not use mask, only need to glue on the substrate and then use UV laser focus for exposure. The standard operation method of the system is like a dot matrix printer, one line at a time.
The exposure of laser according to the designed writing line is similar to the working mode of laser cutting machine or plotter. Only single point system can write vector.
Using 405 nm laser source, the system can achieve up to 300 nm characteristic size.
It is very important to fabricate micro/nano patterned structure on chip to improve the light output efficiency.
In order to obtain accurate structure characteristics in semiconductor process, the width to height ratio of linewidth should be strictly controlled. PicoMaster 100 system can expose grating with high precision.
Up to 4095 gray levels, The development function of holographic library will make the user's latest design concept come true.
PicoMaster can process Fresnel lens and its array in three dimensions by changing the laser energy output.
Chip manufacturing usually requires a very thick photoresist layer, and using low resolution vector writing can ensure the smoothness of the wire channel.