The system supports up to 4095 levels of grayscale, pure binary mode.
The maximum alignment accuracy of the system is less than 250 nm, and the uniformity of line width is less than 50 nm.
The system supports up to 9 “ substrate, 400 mm/s scan speed, 200x200 mm2 exposure area.
The system is designed in a fully enclosed structure, with the necessary components, control architecture and vacuum pump in the housing for quick installation.
When the system is connected to the air temperature regulator unit and the air conditioning is supplied, the built-in stack filters will produce clean cross air flow.
The system motion platform is supported by a mechanical vibration mitigation system, which will filter out most of the noise vibration to ensure the minimum vibration during operation.
It is very important to fabricate micro/nano patterned structure on chip to improve the light output efficiency.
In order to obtain accurate structure characteristics in semiconductor process, the width to height ratio of linewidth should be strictly controlled. PicoMaster 200 system can expose grating with high precision.
Up to 4095 gray levels, The development function of holographic library will make the user's latest design concept come true.
PicoMaster can process Fresnel lens and its array in three dimensions by changing the laser energy output.
Chip manufacturing usually requires a very thick photoresist layer, and using low resolution vector writing can ensure the smoothness of the wire channel.