Available Systems


Product Introduction

ASML’s PAS 5000/50 stepper with a well proven Zeiss 0.48NA i-line lens with a 21.1mm image field diameter. The PAS 5000/50 stepper has been designed for 0.5micron production resolutions using a “process in-depended” alignment system, for a superior production overlay. Systems is available as fully refurbished.
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Key features of the ASML PAS5000/50A i-line wafer stepper:

  • Lens resolution 0.5 micron i-line (365nm)

  • Reduction 5X

  • Field size 21.2 mm dia ( Xmax= 15mm, Ymax= 19mm )

  • UDOF 1.2 micron ( Slope > 83 degrees )

  • Uniformity ± 2.5%

  • Intensity 280 mW/c㎡

  • Reticles 6 (5”), automatic exchange and masking

  • Wafers 100, 125, 150 mm


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